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湿法清洗及腐蚀

¥1,500.00

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分类：前道晶圆制造

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技术指标

晶圆尺寸: 2, 4, 6英寸晶圆及碎片
RCA清洗：DHF+SPM+SC1+SC2
湿法去胶：NMP
氧化物湿法刻蚀: HF or BOE + SC1
前段poly/oxide去除：HF/HNO3+HF+SC1+SC2
后段金属膜层去除：SPM+HF+SC1